聚羟基苯乙烯在光致抗蚀剂中的应用及其合成

doi:10.7517/j.issn.1674-0475.2006.01.67

影像科学与光化学 ›› 2006, Vol. 24 ›› Issue (1): 67-74.DOI: 10.7517/j.issn.1674-0475.2006.01.67

聚羟基苯乙烯在光致抗蚀剂中的应用及其合成

刘建国, 郑家燊, 李平

华中科技大学, 化学系, 湖北, 武汉, 430074

收稿日期:2005-06-27 修回日期:2005-09-16 出版日期:2006-01-23 发布日期:2006-01-23
通讯作者: 郑家燊(1945-), 男, 教授, 博导, 从事材料腐蚀与防护研究.

Applications and Syntheses of Polyhydroxystyrene in Deep UV Photoresist

LIU Jian-guo, ZHENG Jia-shen, LI Ping

Department of Chemistry, Huazhong University of Science and Technology, Wuhan 430074, Hubei, P.R. China

Received:2005-06-27 Revised:2005-09-16 Online:2006-01-23 Published:2006-01-23

摘要/Abstract

摘要： 主要综述了聚羟基苯乙烯用作深紫外光致抗蚀剂主体成膜树脂的发展历程、应用现状以及一些最新的研究进展,并简要介绍了聚羟基苯乙烯的单体衍生物及其聚合物的制备方法.

关键词: 聚羟基苯乙烯, 深紫外光致抗蚀剂, 主体成膜树脂

Abstract: The previous development processes, current application status and some latest progresses of polyhydroxystyrene(PHS) used as base matrix rasin in deep ultraviolet photoresist were mainly reviewed. The syntheses of monomer derivatives and polymers of PHS were also discussed.

Key words: polyhydroxystyrene, deep UV photoresist, matrix resin

中图分类号:

刘建国, 郑家燊, 李平. 聚羟基苯乙烯在光致抗蚀剂中的应用及其合成[J]. 影像科学与光化学, 2006, 24(1): 67-74.

LIU Jian-guo, ZHENG Jia-shen, LI Ping. Applications and Syntheses of Polyhydroxystyrene in Deep UV Photoresist[J]. Imaging Science and Photochemistry, 2006, 24(1): 67-74.

参考文献

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聚羟基苯乙烯在光致抗蚀剂中的应用及其合成

Applications and Syntheses of Polyhydroxystyrene in Deep UV Photoresist

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