SYNTHESIS AND PHOTOSENSITIVITY OF NOVEL PHOTOSENSITIVE EPOXY POLYSILOXANE OLIGOMER

doi:10.7517/j.issn.1674-0475.2002.02.88

Abstract

Abstract: A photosensitive oligomer,cycloaliphatic epoxy polysiloxane,and a new kind of cationic photoinitiator,[CpFe(η 6 tol)]BF 4,was synthesized.The influences of photoinitiators,ratio of oligomer to monomer,and promoters on the rate of photoinitiated cationic polymerization of cycloaliphatic epoxy polysiloxane systems were studied.It shows that the polysiloxane is a high photosensitive oligomer,with a 165 mL/cm 2 optimized photosensitivity when initiated by diaryliodonium salt SR 1012 with sensitizer 651. Moreover,the ability of dark cure of the polysiloxane when initiated by [CpFe(η 6 tol)] BF 4was discussed.

Key words: cycloaliphatic epoxide, arene cyclopentadienyl iron complex, cationic polymerization, polysiloxane, sensitization

CLC Number:

TQ57

HUANG Yu-li, LIU Ji, WANG Tao, LIU Hua-feng . SYNTHESIS AND PHOTOSENSITIVITY OF NOVEL PHOTOSENSITIVE EPOXY POLYSILOXANE OLIGOMER[J]. Imaging Science and Photochemistry, 2002, 20(2): 88-95.

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SYNTHESIS AND PHOTOSENSITIVITY OF NOVEL PHOTOSENSITIVE EPOXY POLYSILOXANE OLIGOMER

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