Preparation and Properties of Two High-Thermostability Matrix Resins for UV Positive Photoresist

doi:10.7517/j.issn.1674-0475.2012.05.330

Abstract

Abstract: Two copolymers poly ((N-(p-hydroxyphenyl)methacrylamide)-co-(N-phenylmaleimide)) poly(HPMI-co-PMA) and poly ((N-phenylmethacrylamide)-co-(N-(p-hydroxyphenyl)maleimide)) poly (PMA-co-HPMI) were prepared from the copolymerizations of N-(p-hydroxyphenyl)methacrylamide and N-phenylmaleimide, and N-phenylmethacrylamide and N-(p-hydroxyphenyl)maleimide, respectively. It showed that both copolymers were 1:1 in molar composition and were alternating. Both had good solubility in organic solvent, film-forming characteristics, hydrophilicity, and high glass transition temperature (T_g > 280℃).As matrix resins,they were mixed respectively with photosensitizer derivative of 2,1,5-diazonaphthoquinone sulfochloride (DNS), additive benzophenone, etc. to obtain two UV positive photoresist. Preliminary photolithographic experiments testified that both photoresists had a resolution of no less than 1 μm and a high-thermostability of up to 270℃.

Key words: UV positive photoresist, matrix resin, thermostability, poly ((N-(p-hydroxyphenyl)methacrylamide)-co-(N-phenylmaleimide)), poly((N-phenylmethacrylamide)-co-(N-(p-hydroxyphenyl)maleimide))

CLC Number:

LIU Jian-guo. Preparation and Properties of Two High-Thermostability Matrix Resins for UV Positive Photoresist[J]. Imaging Science and Photochemistry, 2012, (5): 330-337.

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