Imaging Science and Photochemistry ›› 2006, Vol. 24 ›› Issue (1): 67-74.DOI: 10.7517/j.issn.1674-0475.2006.01.67

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Applications and Syntheses of Polyhydroxystyrene in Deep UV Photoresist

LIU Jian-guo, ZHENG Jia-shen, LI Ping   

  1. Department of Chemistry, Huazhong University of Science and Technology, Wuhan 430074, Hubei, P.R. China
  • Received:2005-06-27 Revised:2005-09-16 Online:2006-01-23 Published:2006-01-23

Abstract: The previous development processes, current application status and some latest progresses of polyhydroxystyrene(PHS) used as base matrix rasin in deep ultraviolet photoresist were mainly reviewed. The syntheses of monomer derivatives and polymers of PHS were also discussed.

Key words: polyhydroxystyrene, deep UV photoresist, matrix resin

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