影像科学与光化学 ›› 1993, Vol. 11 ›› Issue (3): 272-274.DOI: 10.7517/j.issn.1674-0475.1993.03.272

• 研究论文 • 上一篇    下一篇

发光多孔硅的光谱及电化学研究

李学萍, 张振宗, 王维波, 刘尧, 肖绪瑞   

  1. 中国科学院感光化学研究所, 光电化学研究中心 北京 100101
  • 收稿日期:1993-04-07 修回日期:1993-04-16 出版日期:1993-08-20 发布日期:1993-08-20
  • 通讯作者: 李学萍

SPECTRAL AND ELECTROCHEMICAL STUDY ON LIGHT-EMITTING POROUS SILICON

LI XUE-PING, ZHANG ZHEN-ZHONG, WANG WEI-BO, LIU YAO, XIAO XU-RUI   

  1. The Center of Photoelectrochemistry, Institute of Photographic Chemistry, Academia Sinica, Beijing 100101, P. R. China
  • Received:1993-04-07 Revised:1993-04-16 Online:1993-08-20 Published:1993-08-20

摘要: 单晶硅是Eg为1.1eV的间接带隙半导体材料,在可见光区不发光,不能应用于光电子领域.但是,Canham 1990年首次发现[1],适当条件下形成的多孔硅在室温下就可发出强度能与Ⅲ-Ⅴ族半导体发光二极管相媲美的可见光。

关键词: 多孔硅, 光致发光, 电化学

Abstract: The light emitting properties of porous silicon formed by electrochemical etching process and the potential distribution at the Si/electrolyte (HF) interface have been studied. The results show that porous silicon photoluminescent properties are sensitive to the formation conditions. During anodic oxidation, selective dissolution of silicon that leads to porous structure formation has significant influence on the interface capacitance characteristics.

Key words: porous silicon, photoluminescence, electrochemistry