关键词: 纳米氮化硅, PS版耐磨性, 反射密度

Abstract: This paper reported nanoparticle using in PS plate for antiscratching.Offset plate bearing capacity enhanced for thirty percent when 0.15% mass fraction Si₃N₄ was added.The addition of nanoparticle did not affect printing resolving power and photosensitivity when <20 nm silicon nitrification nanoparticle(0.0%—2.0% mass fraction) were dispersed in photosensitive fluid coating.In this process the mixture was homogenized by blender together and an ultrasonicator(Ultrasonic Homogenizer UH-600,SMT Co.) operated at 80% intensity for 10 minutes.Next step,the other ingredient were dissolved.Then the coating was coated by spin coating machine on electrolyte-oxidation aluminium substrate.dried,exposed,developed,antiscratching test.Antiscratching ability was evaluated by the loss of reflection density.The nanoparticle state was observed by SEM.From SEM it could observed that the plate had an optimal antiscratching ability when 0.15% mass fraction Si₃N₄ was added,however,when Si₃N₄ mass fraction was more than 2.0%,Si₃N₄ configuration was observed and the plate antiscratching ability became poor.

Key words: silicon nitrification nanoparticle, PS plate antiscratching, reflection density