关键词: 丙烯酰胺-双丙酮丙烯酰胺共聚物, 聚乙烯吡咯烷酮, 水溶性负性光致抗蚀剂

Abstract: A formula for preparing the photoresist is developed. The main compositions of the formula are P(AM-DAAM), PVP and 4,4′-diazido-2,2′-stilbenedisulfonate sodium salt(DAS). The influence on the light sensitivity by components of the formula is studied. According to the orthogonality method, the results are that: the light sensitivity turns out to be best when the ratio of AM/DAAM of the copolymer by weight is 1:1, the ratio of P(AM-DAAM)/PVP by weight is 1:2, the amount of DAS is 1/2 to the total amount of P(AM-DAAM) and PVP by weight; the amount of the coupling agent is 1/60 to the total amount of P(AM-DAAM) and PVP by weight; the amount of the surface active agent is 1/40 to the total amount of P(AM-DAAM) and PVP by weight. With this formula, the light sensitivity of the photoresist is 58.4 mJ·cm^-2. And a clear pattern can be obtained. With this formula, the light sensitivity of the photoresist can reach the industry requirements. And the photoresist acts as good as the products from abroad.

Key words: copolymer of acrylamide and diacetone acrylamide, polyvinylpyrrolidone, water-soluble negative photoresist