一种新型深紫外正型光致抗蚀剂材料的研究

doi:10.7517/j.issn.1674-0475.2006.05.377

影像科学与光化学 ›› 2006, Vol. 24 ›› Issue (5): 377-381.DOI: 10.7517/j.issn.1674-0475.2006.05.377

一种新型深紫外正型光致抗蚀剂材料的研究

褚战星¹, 程龙², 王文君¹, 王力元¹

1. 北京师范大学, 化学学院, 北京, 100875;
2. 北京化学试剂研究所, 北京, 100022

收稿日期:2006-03-01 修回日期:2006-05-10 出版日期:2006-09-23 发布日期:2006-09-23
通讯作者: 王力元,E-mail:wly@bnu.edu.cn.
基金资助:
国家“十五”“863”专项子课题(2002AA3Z1330-2)

Studies on a Novel Deep UV Positive Photoresist Material

CHU Zhan-xing¹, CHENG Long², WANG Wen-jun¹, WANG Li-yuan¹

1. Chemistry College of Beijing Normal University, Beijing 100875, P. R. China;
2. Beijing Institute of Chemical Reagents, Beijing 100022, P. R. China

Received:2006-03-01 Revised:2006-05-10 Online:2006-09-23 Published:2006-09-23

摘要/Abstract

摘要： 通过松香酸和丙烯酸的Diels-Alder反应得到了一种二酸——丙烯海松酸.丙烯海松酸有大的脂环结构和良好的成膜性,在固体膜层中,它可以和二乙烯基醚,如1,3-二乙烯氧基乙氧基苯,在加热条件下(80℃以上)发生反应,产物在稀碱水中难溶.这样形成的产物在光产酸剂产生的强酸催化下,在温度高于100℃时,可以迅速分解,从而变成稀碱水易溶.因此,用此二酸、二乙烯基醚和产酸剂可组成一种正型的光致抗蚀剂,当用254 nm的低压汞灯曝光时,其感度在30 mJ/cm²以下.

关键词: 正型光致抗蚀剂, 二乙烯基醚, 丙烯海松酸, 光产酸剂

Abstract: Acrylpimaric acid,a diacid with alicyclic structure and good film-forming property,was prepared by the Diels-Alder reaction of abietic acid and acrylic acid.The diacid could react with divinyl ether,such as 1,3-divinyloxyethoxybenzene,in solid film when baked above 80℃ and the film became insoluble in dilute base aqueous.Thus formed compound can be quickly decomposed at the presence of strong acid generated by photoacid generator(PAG) above 100℃ and become easily soluble in dilute aqueous base.A positive photoresist could be formed by the diacid,divinyl ether and PAG.The measured photosensitivity is less than 30 mJ/cm² when exposed to low pressure Hg lamp(254 nm).

Key words: positive photoresist, divinyl ether, acrylpimaric acid, photoacid generator

中图分类号:

O64
TQ57

褚战星, 程龙, 王文君, 王力元. 一种新型深紫外正型光致抗蚀剂材料的研究[J]. 影像科学与光化学, 2006, 24(5): 377-381.

CHU Zhan-xing, CHENG Long, WANG Wen-jun, WANG Li-yuan. Studies on a Novel Deep UV Positive Photoresist Material[J]. Imaging Science and Photochemistry, 2006, 24(5): 377-381.

参考文献

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一种新型深紫外正型光致抗蚀剂材料的研究

Studies on a Novel Deep UV Positive Photoresist Material

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