DISSOLUTION INHIBITION MECHANISMS OF POSITIVE PHOTORESIST BASED ON NOVOLAK-DNQ

doi:10.7517/j.issn.1674-0475.2004.01.33

Abstract

Abstract: The mechanisms of dissolution inhibition of positive photoresist based on novolak(NVK)-diazonaphthoquinone(DNQ),including(1) the molecular hydrogen bonding interactions between novolak and DNQ;(2) mechanism of the azoxy- or azo-coupling reaction of DNQ-ester with novolak resin;(3) the two-step mechanism (also named static and dynamic inhibition) of dissolution inhibition;(4) mechanism of the surface of the photoresist;(5) the molecular dissolution of novolak related to the mechanism of inhibition,was reviewed in this paper.

Key words: novolak, diazonaphthoquinone, positive photoresist, dissolution inhibition

CLC Number:

TQ57

GAO Ying-xin, BAO Yong-zhong, HUANG Zhi-ming, WENG Zhi-xue. DISSOLUTION INHIBITION MECHANISMS OF POSITIVE PHOTORESIST BASED ON NOVOLAK-DNQ[J]. Imaging Science and Photochemistry, 2004, 22(1): 33-43.

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