Studies on a Novel Deep UV Positive Photoresist Material

doi:10.7517/j.issn.1674-0475.2006.05.377

Abstract

Abstract: Acrylpimaric acid,a diacid with alicyclic structure and good film-forming property,was prepared by the Diels-Alder reaction of abietic acid and acrylic acid.The diacid could react with divinyl ether,such as 1,3-divinyloxyethoxybenzene,in solid film when baked above 80℃ and the film became insoluble in dilute base aqueous.Thus formed compound can be quickly decomposed at the presence of strong acid generated by photoacid generator(PAG) above 100℃ and become easily soluble in dilute aqueous base.A positive photoresist could be formed by the diacid,divinyl ether and PAG.The measured photosensitivity is less than 30 mJ/cm² when exposed to low pressure Hg lamp(254 nm).

Key words: positive photoresist, divinyl ether, acrylpimaric acid, photoacid generator

CLC Number:

O64
TQ57

CHU Zhan-xing, CHENG Long, WANG Wen-jun, WANG Li-yuan. Studies on a Novel Deep UV Positive Photoresist Material[J]. Imaging Science and Photochemistry, 2006, 24(5): 377-381.

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