Synthesis and Characterization of the Non-Ionic Photoacid Generator-Phthalimidotosylate

doi:10.7517/j.issn.1674-0475.2007.03.198

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LI Ping, WANG Xia, LIU Jian-guo, LI Ping. Synthesis and Characterization of the Non-Ionic Photoacid Generator-Phthalimidotosylate[J]. Imaging Science and Photochemistry, 2007, 25(3): 198-203.

[1] 郑金红,黄志齐,文武.ULSI用193 nm光刻胶的进展[J].精细化工,2005,22(5):349-353.Zheng J H,Huang Z Q,Wen W.Progress of 193 nm photoresist for ULSI supporting materials[J].Fine Chemicals,2005,22(5):349-353.
[2] 郑金红,黄志齐,侯宏森.248 nm深紫外光刻胶[J].感光科学与光化学,2003,21(5):346-356.Zheng J H,Huang Z Q,Hou H S.Evolution and progress of deep UV 248 nm photoresists[J].Photographic Science and Photochemistry,2003,21(5):346-356.
[3] 杨凌露,张改莲,余尚先.化学增幅抗蚀剂用光产酸源[J].化学通报,2003,7:73-79.Yang L L,Zhang G L,Yu S X.The progress of photoacid generator[J].Chemistry,2003,7:73-79.
[4] Schwartzkopf G,Niazy N N,Das S,et al.Onium salt structure/property relationships in poly(4-tert-butyloxycar-bonyloxystyrene) deep UV resist[J].Proc.SPIE,1991,1466:26-38.
[5] Yamato H,Asakura T,Hintermann T,Ohwa M.Novel non-ionic photoacid generator releasing strong acid for chemically amplified resists[J].Proc.SPIE,2004,5376:103-114.
[6] Yamato H,Asakura T,Matsnmoto A,Ohwa M.Novel photoacid generators for chemically amplified resists[J].Proc.SPIE,2002,4690:799-808.
[7] Asakura T,Yamato H,Matsumoto A,et al.A novel photoacid generator for chemically amplified resists with ArF exposure[J].Proc.SPIE,2003,5039:1155-1163.
[8] Wang L Y,Wang W J,Guo X.The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep UV photoresist[J].Proc.SPIE,2004,5376:608-615.
[9] 朱冰春,王宇光,曹东华,陈银飞.N-羟基邻苯二甲酰亚胺的合成与应用[J].浙江化工,2004,35(4):5-6.Zhu B C,Wang Y G,Cao D H,Chen Y F.Sythesis and application of N-hydroxyphthalimide[J].Zhe Jiang Chemistry,2004,35(4):5-6.
[10] Shigehisa H,Hiroshi S.Preparation of N-hydroxyphthalimide[P].JP,200247270.2002-01-12.
[11] Chan C L,Lien E J,Tokes Z A.Synthesis,biological evaluatuon,and quantitative structure-activity relationship analysis of 2-hydroxy-1H-Isoindoledionesas new cytostatic agents[J].J.Med.Chem.,1987,30:509-514.
[12] Bauer L,Miarka S V.Stereospecific Lossen Rearrangements[J].J.Org.Chem.,1959,24:1293-1296.
[13] Narita M,Teramoto T,Okawara M.Syntheses and Reactions of functional polymers.LIV.synthese and polymerizationa of O-substituted-N-hydroxymaleimides[J].Bulletin of the Chemical Society of Japan,1971,44(4):1084-1089.
[14] Kita Y,Kishino K,Nakagawa K.Synthesis of N-cyclohexylmaleimide for heat-resistant transparent methacrylic resin[J].Journal of Applied Polymer Science,1997,63:363-368.
[15] 杜敬星,郑人卫,肖孝辉.N-羟基丁二酰亚胺的合成[J].应用化学,2003,20(6):611-612.Du J X,Zheng R W,Xiao X H.Synthesis of N-hydroxysuccinimide[J].Chinese Journal of Applied Chemistry,2003,20(6):611-612.
[16] 姚金水,吴佑实.N-苄氧基邻苯二甲酰亚胺的合成[J].合成化学,2001,9(5):455-456.Yao J S,Wu Y S.Synthesis of N-benzyloxyphalimide[J].Chinese Journal of Synthesis Chemistry,2001,9 (5):455-456.
[17] Cameron J F,Adams T,Orellana A J,et al.Complex triarylsulfonium salts as photoacid generators for deep UV microlithography:synthesis,identification and lithographic characterization of key individual components[J].Proc.SPIE,1997,3049:473-484.

Synthesis and Characterization of the Non-Ionic Photoacid Generator-Phthalimidotosylate

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