EVOLUTION AND PROGRESS OF DEEP UV 248 nm PHOTORESISTS

doi:10.7517/j.issn.1674-0475.2003.05.346

Abstract

Abstract: Deep UV lithography operating at 248 nm with use of chemical amplification resists has finally become a production technology.This paper describes the evolution and progress of the deep UV 248 nm photoresists from aspects of birth of chemical amplification technology,evolution of deep UV 248 nm resists in matrix resins and PAG,dissolution inhibitor,processing problems and solutions of them.

Key words: chemical amplification, KrF excimer laser, deep UV lithography, 248 nm photoresists, matrix resins, acid-catalysis, photoacid generator

CLC Number:

ZHENG Jin-hong, HUANG Zhi-qi, HOU Hong-sen. EVOLUTION AND PROGRESS OF DEEP UV 248 nm PHOTORESISTS[J]. Imaging Science and Photochemistry, 2003, 21(5): 346-356.

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