[1] 王巍,彭彦彬,余青,等.硫增感技术的进展[J].感光材料1996,4:8-10.Wang W, Peng Y B, Yu Q, et al.Investigation of sulfur sensitization process[J].Photographic Materials, 1996,4: 8-10. [2] 谷忠昭著.刘春燕译.照相感光度-理论和机理[M]石家庄:河北教育出版社,2002.205.Tadaaki Tani.Translated by Liu C Y.Photographic Sensitivity-Theory and Mechanisms [M].Shijiazhuang: Hebei Educationa Publishing Company, 2002.205. [3] 胡勇军,王荣琴,彭必先.电镜法对硫敏化中心的直接观察[J].感光科学与光化学,1997,15:230.Hu Y J ,Wang R Q, Peng B X.Direct observation on the sulfur sensitization centers with the electron microscopy.[J].Photographic Science and Photochemistry, 1997,15: 230. [4] 史瑶,赵文芳,杨新民,夏培杰.硫增感的敏化中心和潜影中心的氧化还原性能的研究[J].感光科学与光化学,2002,18:150.Shi Y, Zhao W F, Yang X M, Xia P J.Study on the redox properties of sulfur sensitivity centers and latent image centers[J].Photographic Science and Photochemistry, 2002,18:150. [5] Yang S P, Li X W, Han L, Fu G S.Photoelectron decay characteristic of silver halide microcrystal illuminated by short pulse laser[J].Chinese Physics Letter ,2002,19:429. [6] Yang S P, Fu G S, Li X W, et al.Influence of spectral sensitization on electrons decay characteristics in silver halide emulsion[C].Tokyo: Intermational Congress of Imaging Science, 2002. [7] Fu G S, Yang S P, Li X W, et al.Photoelectrons decay kinetics mechanism of spectral sensitization in silver halide emulsion[C].Tokyo: International Congress of Imaging Science 2002. [8] COELHOR著.吕景楼,李守义译电介质物理学[M]北京:科学出版社,1984,62-63.COELHO R.Translated by Lu J L, Li S Y.Physics of Dielectrics for the Engineer [M].Amsterdam: Elsevier Scientific Publishing Company, 1979.62-63. [9] 倪尔瑚.材料科学中的介电谱技术[M].北京:科学出版社,1999.15-287.Ni E H.The Spectrum of Dielectic-Electricity in the Material Scienee [M].Beijing: Science Publishing Company,1999.15-287. [10] 韩理,陆晓东,杨少鹏.感光材料光电子的微波相敏检测技术[J].信息记录材料,2002,4:57-61Han L,Lu X D,Yang S P, et al.The technique of microwave phase-sensitive detecting the photodectrons of silver halide[J].Information Record Material, 2002,4: 57-61. [11] 王巍,彭彦彬,余青,等.硫增感技术的进展[J].感光材料,1996,4:8.Wang W, Peng Y B,Yu Q,et al.Investigation of sulfur sensitization process[J].Photographic Materials, 1996,4:8-10. [12] Takaji Kaneda.A new approach to estimation of depth of electron traps in AgBr emulsion grains on the basis of the Gumey-Mott model[J].J.Imaging Sci., 1989,33:116. |