Progress in Photoresist for Immersion Lithography

doi:10.7517/j.issn.1674-0475.2009.05.379

Abstract

Abstract: Immersion lithography is an advanced technology to improve the resolution,which uses high refractive index immersion liquids to replace the original air space based on dry lithography.The application of the technology plays a key role in the rapid development of IC industry.This paper gives an overview of development history of immersion lithography,the challenges being faced and the requirements of the immersion photoresist;the recent progress of the main resin,the photo-acid generator and the additives are reviewed.At last the research and development trend of immersion photoresist is explored and a preliminary forecast is made.

Key words: immersion lithography, photoresist, resin, photo-acid generator

CLC Number:

TQ57

HE Jian, SHENG Rui-long, MU Qi-dao. Progress in Photoresist for Immersion Lithography[J]. Imaging Science and Photochemistry, 2009, 27(5): 379-390.

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