Synthesis and Lithographic Performance of Molecular Glass Photoresists with Covalently Bonded Photo-acid Generator

doi:10.7517/issn.1674-0475.211001

Abstract

Abstract: A molecular glass material HPS-MSF covalently bonded with photoacid generator (PAG) was designed and synthesized. It exhibits good thermal stability and film-forming properties. A negative-tone molecular glass photoresist based on HPS-MSF as the main material and 1,3,4,6-tetrakis(methoxymethyl)glycoluril (TMMGU) as the cross-linking agent was prepared. The formulation, post-baking and development conditions of the photoresist were initially studied by 254 nm ultraviolet exposure. The negative-tone photoresist was further evaluated using electron beam lithography. Patterns of a line width of 150 nm in period of 300 nm were obtained at exposure doses of 140 μC/cm² and 110 μC/cm² for photoresist containing 15% and 30% TMMGU, respectively.

Key words: molecular glass, photoresist, electron beam lithography, photo-acid generator

ZHANG Weijie, CHEN Jinping, YU Tianjun, ZENG Yi, LI Yi. Synthesis and Lithographic Performance of Molecular Glass Photoresists with Covalently Bonded Photo-acid Generator[J]. IMAGING SCIENCE AND PHOTOCHEMISTRY, 2022, 40(2): 211-219.

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