影像科学与光化学
 
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Imaging Science and Photochemistry  2016, Vol. 34 Issue (2): 123-135    DOI: 10.7517/j.issn.1674-0475.2016.02.123
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Research Progress of the Bottom Anti-reflective Coating for Photoresist
WANG Kuan1, LIU Jingcheng1, LIU Ren1, MU Qidao2, ZHENG Xiangfei2, JI Changwei2, LIU Xiaoya1
1. School of Chemical and Material Engineering, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China;
2. Suzhou Rui Hong Electronic Chemicals Co., Ltd., Suzhou 215124, Jiangsu, P. R. China

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