含N-苯基马来酰亚胺甲基丙烯酸酯共聚物的合成及其在负性光致抗蚀剂中的应用

doi:10.7517/j.issn.1674-0475.2015.03.230

影像科学与光化学 ›› 2015, Vol. 33 ›› Issue (3): 230-237.DOI: 10.7517/j.issn.1674-0475.2015.03.230

含N-苯基马来酰亚胺甲基丙烯酸酯共聚物的合成及其在负性光致抗蚀剂中的应用

刘敬成¹, 郑祥飞¹, 林立成¹, 穆启道², 孙小侠², 刘晓亚¹

1. 江南大学化学与材料工程学院, 江苏无锡 214122;
2. 苏州瑞红电子化学品有限公司, 江苏苏州 215124

收稿日期:2014-11-05 修回日期:2015-02-13 出版日期:2015-05-15 发布日期:2015-05-15
通讯作者: 刘晓亚

Synthesis of Methacrylate Copolymers Containing N-PMI and Their Application in Negative-type Photoresist

LIU Jingcheng¹, ZHENG Xiangfei¹, LIN Licheng¹, MU Qidao², SUN Xiaoxia², LIU Xiaoya¹

1. School of Chemical & Material Engineering, Jiangnan University, Wuxi 214122, Jiangsu, P.R.China;
2. Suzhou Ruihong Electronic Chemicals Co. Ltd., Suzhou 215124, Jiangsu, P.R.China

Received:2014-11-05 Revised:2015-02-13 Online:2015-05-15 Published:2015-05-15

摘要/Abstract

摘要：

以甲基丙烯酸(MAA)、甲基丙烯酸甲酯(MMA)、N-苯基马来酰亚胺(N-PMI)、甲基丙烯酸环己基酯(CHMA)为反应单体,通过自由基共聚合成了一系列共聚物PMMNC,然后与甲基丙烯酸缩水甘油酯(GMA)反应制备了甲基丙烯酸酯共聚物G-PMMNC.利用傅立叶红外光谱(FT-IR)、核磁共振氢谱(¹HNMR)、凝胶渗透色谱(GPC)、差示扫描量热(DSC)等表征了共聚物的结构与性能.随着N-PMI含量的升高,共聚物的分子量增大,玻璃化转变温度升高;以G-PMMNC为基体树脂制备了光致抗蚀剂,考察了光致抗蚀剂的耐酸性和分辨率,研究结果表明,该光致抗蚀剂的耐酸性良好,分辨率为40 μm.

关键词: N-苯基马来酰亚胺, 甲基丙烯酸酯共聚物, 光致抗蚀剂, 分辨率

Abstract:

Methacrylic Acid (MAA), Methyl Methacrylate (MMA), N-Phenylmaleimide (N-PMI) and Methacrylic Acid Cyclohexyl Ester (CHMA) were used to synthesize copolymer with different content of N-Phenylmaleide (N-PMI) through free radical polymerization to develop a prepolymer(PMMNC). Then a methacrylate copolymer G-PMMNC was prepared by reaction of the PMMNC and Glycidyl Methacrylate (GMA). Fourier transform infrared spectroscopy (FT-IR), nuclear magnetic resonance spectroscopy (¹HNMR), gel permeation chromatography (GPC), and differential scanning calorimetry (DSC) were used to characterize the structure and properties of copolymers. The results showed that the molecular weight and the glass transition temperature of copolymers increased with the increase of the content of N-PMI. Negative-photoresists based on G-PMMNC were prepared,the resolution of which could reach 40 μm, and have a good acid etching resistance.

Key words: N-Phenylmaleimide, methacrylate copolymer, photoresist, resolution

刘敬成, 郑祥飞, 林立成, 穆启道, 孙小侠, 刘晓亚. 含N-苯基马来酰亚胺甲基丙烯酸酯共聚物的合成及其在负性光致抗蚀剂中的应用[J]. 影像科学与光化学, 2015, 33(3): 230-237.

LIU Jingcheng, ZHENG Xiangfei, LIN Licheng, MU Qidao, SUN Xiaoxia, LIU Xiaoya. Synthesis of Methacrylate Copolymers Containing N-PMI and Their Application in Negative-type Photoresist[J]. Imaging Science and Photochemistry, 2015, 33(3): 230-237.

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含N-苯基马来酰亚胺甲基丙烯酸酯共聚物的合成及其在负性光致抗蚀剂中的应用

Synthesis of Methacrylate Copolymers Containing N-PMI and Their Application in Negative-type Photoresist

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