水溶性光致抗蚀剂研究进展

doi:10.7517/j.issn.1674-0475.2007.01.69

影像科学与光化学 ›› 2007, Vol. 25 ›› Issue (1): 69-79.DOI: 10.7517/j.issn.1674-0475.2007.01.69

• 综述 • 上一篇

水溶性光致抗蚀剂研究进展

翟晓晓, 褚战星, 王力元

北京师范大学, 化学学院, 北京, 100875

收稿日期:2006-06-28 修回日期:2006-08-28 出版日期:2007-01-23 发布日期:2007-01-23
通讯作者: 王力元

Research Development on Water-Soluble Photoresist

ZHAI Xiao-xiao, CHU Zhan-xing, WANG Li-yuan

College of Chemistry, Beijing Normal University, Beijing 100875, P.R.China

Received:2006-06-28 Revised:2006-08-28 Online:2007-01-23 Published:2007-01-23

摘要/Abstract

摘要： 本文按传统光化学反应型和化学增幅型两种类型对近10年水溶性光致抗蚀剂的发展状况做了分类总结,并重点介绍了成像反应原理和各体系的优缺点.

关键词: 水溶性光致抗蚀剂, 化学增幅, 正型, 负型

Abstract: Studies on water-soluble photoresists during the last decade have been summarized in two parts: traditional photochemical reaction type and chemically amplified type.The chemical mechanism and the characteristics of the lithographic systems were mainly introduced.

Key words: water-soluble photoresist, chemically amplified, positive tone, negative tone

中图分类号:

翟晓晓, 褚战星, 王力元. 水溶性光致抗蚀剂研究进展[J]. 影像科学与光化学, 2007, 25(1): 69-79.

ZHAI Xiao-xiao, CHU Zhan-xing, WANG Li-yuan. Research Development on Water-Soluble Photoresist[J]. Imaging Science and Photochemistry, 2007, 25(1): 69-79.

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水溶性光致抗蚀剂研究进展

Research Development on Water-Soluble Photoresist

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