193-nm光刻中的光致抗蚀剂

doi:10.7517/j.issn.1674-0475.2000.01.77

影像科学与光化学 ›› 2000, Vol. 18 ›› Issue (1): 77-84.DOI: 10.7517/j.issn.1674-0475.2000.01.77

193-nm光刻中的光致抗蚀剂

陈明, 陈其道, 洪啸吟

清华大学化学系, 北京100084

收稿日期:1999-06-01 修回日期:1999-07-21 出版日期:2000-02-20 发布日期:2000-02-20
通讯作者: 洪啸吟
基金资助:
国家自然科学基金资助项目(批准号:59773007)

Received:1999-06-01 Revised:1999-07-21 Online:2000-02-20 Published:2000-02-20

摘要/Abstract

摘要： 当今世界处于信息时代,电子信息产业日新月异地飞速发展着,计算机的影响已遍及每一个经济领域和人们生活的每一个方面.微电子技术作为新技术革命的主角,已成为衡量一个国家经济实力和科技进步的重要标志^[1,2].微电子技术的不断发展得益于半导体与集成技术的不断提高,光刻技术和光致抗蚀剂是微电子技术中的核心技术和关键材料.

关键词: 193-nm, 化学增幅抗蚀剂, 光刻, 光敏产酸物

陈明, 陈其道, 洪啸吟. 193-nm光刻中的光致抗蚀剂[J]. 影像科学与光化学, 2000, 18(1): 77-84.

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193-nm光刻中的光致抗蚀剂

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