h-线敏感光致产碱剂PNCDP的合成与表征

doi:10.7517/j.issn.1674-0475.2009.02.95

影像科学与光化学 ›› 2009, Vol. 27 ›› Issue (2): 95-102.DOI: 10.7517/j.issn.1674-0475.2009.02.95

h-线敏感光致产碱剂PNCDP的合成与表征

刘金刚¹, Mitsuru Ueda²

1. 中国科学院, 化学研究所, 高技术材料实验室, 北京, 100190;
2. 东京工业大学, 有机高分子物质专攻, 东京, 152-8552, 日本

收稿日期:2008-07-01 修回日期:2008-07-15 出版日期:2009-03-23 发布日期:2009-03-23
基金资助:
北京市科委资助项目(Z08080302110801)

Synthesis and Characterization of a New h-Line Sensitive o-Nitrobenzyl Carbamate Photobase Generator

LIU Jin-gang¹, Mitsuru Ueda²

1. Laboratory of Advanced Polymer Materials, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China;
2. Department of Organic and Polymeric Materials, Tokyo Institute of Technology, Tokyo 152-8552, Japan

Received:2008-07-01 Revised:2008-07-15 Online:2009-03-23 Published:2009-03-23

摘要/Abstract

摘要： 设计并合成了一种对高压汞灯发射光谱中的h-线(405 nm)敏感的新型光致产碱剂(PBG)——N-{[(5-哌啶-2-硝基苄基)氧]-羰基}-2,6-二甲基哌啶(PNCDP).通过红外(IR)、核磁(NMR)以及元素分析对PNCDP的结构进行了表征.紫外-可见光谱(UV-Vis)测试结果表明,与传统的i-线(365 nm)敏感PBG——N-{[(4,5-二甲氧基-2-硝基苄基)氧]-羰基}-2,6-二甲基哌啶(DNCDP)相比,PNCDP的最大紫外吸收波长为395.5 nm,较DNCDP红移了52.5 nm.初步光刻实验表明,PNCDP对h-线具有较好的敏感度.

关键词: 光致产碱剂, h-线, 聚酰亚胺, 光致抗蚀剂

Abstract: A new photobase generator (PBG),N-{[ (2-nitro-5-piperidinylbenzyl)oxy]-carbonyl}-2,6-dimethylpiperidine (PNCDP) was designed and synthesized.The chemical structure was identified by FT-IR,NMR,and elemental analysis.PNCDP exhibited the maximum absorbance wavelength of 395.5 nm by UV-Vis measurement,which was 52.5 nm longer than that of the conventional PBG N-{[ (2-nitro-4,5-dimethoxybenzylpiperidinyl)oxy]carbonyl}-2,6-dimethyl-piperidine (DNCDP).Preliminary photolithography test showed that the PNCDP showed good sensitivity upon irradiation at h-line (405 nm) of high-pressure mercury lamp.

Key words: photobase generator, h-line, polyimide, photoresist

中图分类号:

O644

刘金刚, Mitsuru Ueda. h-线敏感光致产碱剂PNCDP的合成与表征[J]. 影像科学与光化学, 2009, 27(2): 95-102.

LIU Jin-gang, Mitsuru Ueda. Synthesis and Characterization of a New h-Line Sensitive o-Nitrobenzyl Carbamate Photobase Generator[J]. Imaging Science and Photochemistry, 2009, 27(2): 95-102.

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h-线敏感光致产碱剂PNCDP的合成与表征

Synthesis and Characterization of a New h-Line Sensitive o-Nitrobenzyl Carbamate Photobase Generator

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