Synthesis of Methacrylate Copolymer via RAFT Polymerization and Their Application in Negative Photoresist

doi:10.7517/j.issn.1674-0475.2016.04.371

Abstract

Abstract:

A series of methacrylate copolymers PMBBH were synthesized through reversible addition-fragmentation chain tansfer polymerization (RAFT). Methacrylic acid (MAA), benzyl methacrylate (BZMA), and hydroxyethyl methacrylate (HEMA) were used as comonomers. Azobisisobutyronitrile (AIBN) was used as an initiator and 2-(dodecylsulfanylthiocarbonylsulfanyl)-2-methylpropionic acid(DMP) as the chain transfer agent. The structure and properties of polymers were characterized by fourier transform infrared spectroscopy (FT-IR), proton nuclear magnetic resonance spectroscopy (¹HNMR) and gel permeation chromatography (GPC). Negative photoresist based on PMBBH was prepared. Effect of molecular weight on the resolution of photoresist had been examined. The results showed that photoresist based on PMHBB-2 with the number-average molecular weight of 5.45×10³ g/mol and the weight-average molecular weight of 7.79×10³ g/mol exhibited the best performance with sub-50 μm resolution.

Key words: reversible addition-fragmentation chain transfer polymerization (RAFT), methacrylate copolymer, photoresist

LIN Licheng, XU Wenjia, LIU Jingcheng, LIU Ren, MU Qidao, LIU Xiaoya. Synthesis of Methacrylate Copolymer via RAFT Polymerization and Their Application in Negative Photoresist[J]. Imaging Science and Photochemistry, 2016, 34(4): 371-379.

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