共价键合光致产酸剂的单分子树脂光刻胶:合成及光刻性能

doi:10.7517/issn.1674-0475.211001

影像科学与光化学 ›› 2022, Vol. 40 ›› Issue (2): 211-219.DOI: 10.7517/issn.1674-0475.211001

共价键合光致产酸剂的单分子树脂光刻胶:合成及光刻性能

张卫杰^1,2, 陈金平¹, 于天君¹, 曾毅^1,2, 李嫕^1,2

1. 中国科学院理化技术研究所, 光化学转换与功能材料重点实验室, 北京 100190;
2. 中国科学院大学, 北京 100049

收稿日期:2021-10-26 出版日期:2022-03-15 发布日期:2022-03-08
通讯作者: 陈金平, 李嫕
基金资助:
国家自然科学基金项目(22090012)和国家科技重大专项(2018ZX02102-005)资助

Synthesis and Lithographic Performance of Molecular Glass Photoresists with Covalently Bonded Photo-acid Generator

ZHANG Weijie^1,2, CHEN Jinping¹, YU Tianjun¹, ZENG Yi^1,2, LI Yi^1,2

1. Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China;
2. University of Chinese Academy of Sciences, Beijing 100049, P. R. China

Received:2021-10-26 Online:2022-03-15 Published:2022-03-08

摘要/Abstract

摘要： 设计合成了一种共价键合光致产酸剂(PAG)的单分子树脂(molecular glass)材料HPS-MSF,该材料具有良好的热稳定性和成膜性。以该单分子树脂为主体材料,四甲氧基甲基甘脲(TMMGU)为交联剂进行配方,制备得到负型单分子树脂光刻胶。通过254 nm紫外曝光初步研究了光刻胶的配方、后烘及显影条件。进一步利用电子束光刻对该负型光刻胶进行评价,当TMMGU添加量为15%或30%时,在曝光剂量分别为140μC/cm²和110 μC/cm²时,均可以得到线宽为150 nm,周期300 nm的光刻条纹。

关键词: 单分子树脂, 光刻胶, 电子束光刻, 光致产酸剂

Abstract: A molecular glass material HPS-MSF covalently bonded with photoacid generator (PAG) was designed and synthesized. It exhibits good thermal stability and film-forming properties. A negative-tone molecular glass photoresist based on HPS-MSF as the main material and 1,3,4,6-tetrakis(methoxymethyl)glycoluril (TMMGU) as the cross-linking agent was prepared. The formulation, post-baking and development conditions of the photoresist were initially studied by 254 nm ultraviolet exposure. The negative-tone photoresist was further evaluated using electron beam lithography. Patterns of a line width of 150 nm in period of 300 nm were obtained at exposure doses of 140 μC/cm² and 110 μC/cm² for photoresist containing 15% and 30% TMMGU, respectively.

Key words: molecular glass, photoresist, electron beam lithography, photo-acid generator

张卫杰, 陈金平, 于天君, 曾毅, 李嫕. 共价键合光致产酸剂的单分子树脂光刻胶:合成及光刻性能[J]. 影像科学与光化学, 2022, 40(2): 211-219.

ZHANG Weijie, CHEN Jinping, YU Tianjun, ZENG Yi, LI Yi. Synthesis and Lithographic Performance of Molecular Glass Photoresists with Covalently Bonded Photo-acid Generator[J]. IMAGING SCIENCE AND PHOTOCHEMISTRY, 2022, 40(2): 211-219.

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共价键合光致产酸剂的单分子树脂光刻胶:合成及光刻性能

Synthesis and Lithographic Performance of Molecular Glass Photoresists with Covalently Bonded Photo-acid Generator

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